CVD Micro-diamond Coated Tool Lapping with Sapphire Wafer
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Abstract:
Micro-diamond films were prepared on YG6 substrate by hot filament chemical vapor deposition method. An innovative micro-diamond coated tool was used to the lap sapphire wafer. The effect of load, rotating speed, and lapping time on material removal rate(MRR) and surface roughness was investigated. The results showed that the best process parameters were 3 N, 100 r/min and 15 min. The surface quality of sapphire improved significantly after lapping. The coating after lapping adhered well and did not show any peeling. The innovative micro-diamond coated tool was feasible and suitable for the lapping of the single crystal sapphire wafer.
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This research was supported by the National Nature Science Foundation of China (No.51275230), NUAA Research Funding (No.kfjj20150507), Six Talent Peak of Jiangsu (No.ZBZZ-002), the Funding of Jiangsu Innovation Program for Graduate Education (No.KYLX_0227), and the Fundamental Research Funds for the Central Universities.
Feng Wei, Lu Wenzhuang, Yu Yaping, Yang Bin, Zuo Dunwen. CVD Micro-diamond Coated Tool Lapping with Sapphire Wafer[J]. Transactions of Nanjing University of Aeronautics & Astronautics,2017,34(1):81-88